2 edition of High voltage electron beam technology found in the catalog.
High voltage electron beam technology
by U.S. Environmental Protection Agency, Superfund Innovative Technology Evaluation in [Washington, D.C.]
Written in English
|Contributions||Superfund Innovative Technology Evaluation Program (U.S.)|
|The Physical Object|
The first free-electron laser was developed by John Madey in at Stanford University utilizing technology developed by Hans Motz and his coworkers, who built an undulator at Stanford in , using the wiggler magnetic configuration. Madey used a 43 MeV electron beam . &EPA United States Environmental Protection Agency EPA//MR/ July SUPERFUND INNOVATIVE TECHNOLOGY EVALUATION Demonstration Etalletin High Voltage Electron Beam Technology High Voltage Environmental Applications, Inc. Technology Description: The high voltage electron beam (E-beam) technology was developed by High Voltage Environ- mental Applications, .
Book Description. Addresses a Growing Need for High-Power and High-Frequency Transistors. Gallium Nitride (GaN): Physics, Devices, and Technology offers a balanced perspective on the state of the art in gallium nitride technology. A semiconductor commonly used in bright light-emitting diodes, GaN can serve as a great alternative to existing devices used in microelectronics. This report evaluates a high-voltage electron beam (E-beam) technology’s ability to destroy volatile organic compounds (VOC) and other contaminants present in liquid wastes. Specifically, this report discusses performance and economic data from a Superfund Innovative Technology Evaluation (SITE) demonstration of the technology and one case study.
Using magnetic lenses, by which the beam can be shaped into a narrow cone and focused to a very small diameter. This allows for a very high surface power density on the surface to be welded. Values of power density in the crossover (focus) of the beam can be as high as 10 4 – 10 6 W/mm 2. This article presents the demonstration of several compact millimetre wave sources driven both by a pencil or sheet electron beam from a pseudospark (PS) discharge. The millimetre wave sources include two pencil beam extended interaction oscillators (EIO) in W-band (75– GHz), two sheet beam EIOs in W- and G-bands, two pencil beam backward wave oscillators (BWO) in W- and G-bands, and one Author: Wenlong He, Jie Xie, Jie Xie, Alan Phelps, Adrian Cross, Huabi Yin, Guoxiang Shu, Yong Yin, Kevin Ro.
The New-England diary, or, Almanack for the year of our Lord Christ 1734.
intellectual milieu of John Dryden
Second annual conference on Astronomical Data Analysis Software and Systems
Drill-book of elocution
Karl Marx and Frederick Engels; selected works.
Institution of Education
Charity Schools provided by the French Protestant institutions in London 1682-1831
John H. Finfrock.
First among sequels
Elements of the Theory of Functions of a Complex Variable: With Especial ...
These old shades; (and), Sprig muslin ; (and), Sylvester ; (and), The Corinthian ; (and), The convenient marriage
High Voltage Environmental Applications Inc. electron beam technology Paperback – January 1, Anonymous. High Voltage Vacuum Insulation: Basic Concepts and Technological Practice provides a modern working manual for this specialized technology that is generic to a wide range of applications.
The format makes the text suitable for use as a basis for special topic lecture courses at. The high energy electron beam irradiation technology is a low temperature method for destroying complex mixtures of hazardous organic chemicals in solutions containing solids.
The system consists of a computer-automated, portable electron beam accelerator and a delivery system. The system requires only a mixing tank to slurry the treatable solids. Realize Overlay Measurements of Semiconductor Device Patterns Using Electron Beam Advanced High Voltage CD-SEM *1 - CV Series is capable of measuring High Aspect Ratio (HAR) trenches and contact holes, and to perform overlay measurements of device patterns to help customers increase productivity in semiconductor device manufacturing.
improved the reproducibility of the high voltage glow discharge and of the electron beam parameters . The low current discharge (approx. µA) was produced by using a resistance R2 (R2 = 30 MΩ) that by-passes the spark-gap switch.
The electron beam energy spectrum was determined with a magnetic analyser placed behind the anode (Fig. 3).File Size: KB. The High voltage electron beam technology book of high voltage electron beam lithography in submicron VLSI fabrication is outlined.
Continuously-moving-stage EB systems with small deflection width are suited to high voltage electron beam machines. At 50 kV, the following experimental results were obtained: 1. (1) μm lines of PMMA are formed on a μm step. by: High Voltage AC-DC Power Supplies High voltage power supplies for high power applications.
The Glassman name has become synonymous with high reliability, dedication to technology development, lean manufacturing principles and customer support which. The many basic high-voltage engineering technology aspects high-voltage generation, eld calculations, and discharge phenomena are shown in prac- Electromagnetism Beam impedance reduction Vacuum high voltage breakdown in traveling wave structures.
Pulsed power semiconductor applications One electron creates new electrons per unit length. Electron energies typically vary from the keV to MeV range, depending on the depth of penetration required.
The irradiation dose is usually measured in grays but also in Mrads (1 Gy is equivalent to rad). The basic components of a typical electron-beam processing device are illustrated in the figure.
NHV Corporation has a booth in Tire Technology EXPO Tire Technology EXPO is the world's premier tire technology showcase. In the 20th Tire Technology EXPO taking place in Hannover, Germany in February 25th - 27th,we will have a booth focusing on our electron beam technology and offer how this can help your tire production process.
Electron Beam Power Supplies. Highly stable and accurate electron beam power supplies suitable for electron beam printing, electron beam welding and electron beam melting. With process applications in 3D printing / additive manufacturing. We have a high voltage power supply that. The electron accelerator equipment producing the high-voltage beam also has various applications in the medical field and surgical supplies.
Electron beam sterilisation is a successful technology used for sterilisation of disposable medical appliances and devices with a wide range of densities. Woodhead Publishing, - Technology & Engineering - pages 2 Reviews Translated from the German, this is a practical book for engineers which explains the trials, development and manufacturing processes involved in electron beam welding.5/5(2).
high-voltage, scanned-type electron beam accelerators. Both of these high-energy curing options were not suited for commercial applications because of prohibitive capital equipment costs. The development of low-energy ( kV) EB equipment was considered a breakthrough in the curing technology—especially since.
Ferrotec offers High Voltage Electron Beam Power Supplies designed for use with an e-gun source. The CV-6SLX is a 6-kW and the CVSLX is a kW, constant-voltage switching power supply.
The Carrera series of power supplies offer high efficiency and fast arc detection and recovery in. Electron-beam machining is a process in which high-velocity electrons are concentrated into a narrow beam with a very high planar power density. The beam cross-section is then focused and directed toward the work piece, creating heat and vaporizing the material.
Electron-beam machining can be used to accurately cut or bore a wide variety of metals. The electron beam. The power is determined by acceleration voltage and beam current, with electromagnetic systems manipulating the electron beam by deflection and focusing. In the fine working spot of the focused electron beam, the power density is up to 10 8 W/cm².
All beam parameters can be infinitely and accurately changed at high speed so. Hitachi High-Tech will strive to meet customers needs in dimensions measurements and defect inspection for the development and mass production of semiconductor devices by supplying electron beam based products such as traditional CD-SEM, High voltage CV Series, and wafer inspection systems based on optical technologies.
Get this from a library. High voltage electron beam technology: High Voltage Environmental Applications, Inc. [Superfund Innovative Technology Evaluation Program (U.S.);].
Electron-beam lithography is a direct writing modus operandi and differs significantly from the photolithography. It is a time-consuming serial process and an expensive technique.
For electron-beam lithography a focused electron beam is scanned over a substrate covered with an electron-sensitive resist. The electron bombardment changes the resist, typically PMMA or methacrylate, chemically or. Electron-beam lithography (often abbreviated as e-beam lithography, EBL) is the practice of scanning a focused beam of electrons to draw custom shapes on a surface covered with an electron-sensitive film called a resist (exposing).
The electron beam changes the solubility of the resist, enabling selective removal of either the exposed or non-exposed regions of the resist by immersing it in a.The E-beam technology was developed by High Voltage Environmental Applications, Inc. (HVEA). The technology irradiates water with a beam of high-energy electrons, causing the formation of three primary transient reactive species: aqueous electrons, hydroxyl radicals, and hydrogen radicals.A high-current filament power supply FPS, floating at the high-voltage potential, is further needed to heat the electron-emitting filament.
The control unit is responsible for all security issues, the beam positioning and power setting, thus basically providing the user-interface for the whole e-beam evaporation system.